A Study of Reduction Au Wire Bonding Process with Al Pad Metallization on VLSI Devices
Abstract

Nowadays, microelectronic industries are developed in production process and materials for high performance integrated circuits. Wire bonding development is sequence according to reduce integrated size, lowest available cost and remain the process standard. The bonding quality between Au wire and Al pad metallization on ICs is depended on several parameters. This thesis investigates the effect of these parameters which affect the optimize conditions. The resulting data from analytical statistic program is related to Au wire diameter and shear force. The high quality bonding due to optimized contact area between Au wire and Al pad can apply to the ICs applications with small both contact area and contact spacing by decreasing Au wire diameter. Consequently these advantages are able to use for packaging with some type of BGA and TQFP.

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