Structural MIS Diode Fabricated from Diamond Films
Abstract

Consequently semiconducting diamond film can be synthesized with ethylalcohol by thermal CVD method[1]. This paper presents the application of diamond films being diode with a metal / intrinsic diamond semiconductor / p-type diamond semiconductor structure (MIS diode). Aluminium and Boron are used as metal contact and p-type doped impurity respectively. Effect of Boron-doped concentration and the thickness of intrinsic film are investigated. It's found that the reverse breakdown voltage is increased if the thickness of intrinsic layer is increased. And the forward current is decreased if the boron-doped concentration is decreased.

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